Methods and apparatus for micro-electro-mechanical systems (mems) devices
OwnerJohn Wesley Hamlin, Kathleen Rose Ferreira +2inventors
InventorsJohn Wesley Hamlin, Kathleen Rose Ferreira, Sean C. O'Brien, Jose A. Martinez
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Abstract
Example methods, systems, and apparatus described herein provide a minimally invasive technique of controlling shape and stress in a MEMS device. An example method includes depositing a layer of material continuously across a semiconductor wafer, exposing the layer of material to oxygen plasma to increase a relative amount of oxygen within the layer of material; and etching the layer of material after exposing the layer of material to the oxygen plasma.
Claims20
A micro-electro-mechanical system (MEMS) device comprising:
- a static layer;
- and
- a mechanical layer connected to the static layer, the mechanical layer having a first region over a second region, the first region having a greater amount of oxygen than the second region, wherein a shape or a stress of the mechanical layer is based on a thickness of the first region.
A method comprising:
- depositing a layer of material continuously across a semiconductor wafer;
- exposing the layer of material to oxygen plasma to increase an amount of oxygen within the layer of material;
- and
- etching the layer of material after exposing the layer of material to the oxygen plasma.
A digital micromirror device (DMD) comprising:
- a static layer;
- a hinge layer connected to the static layer;
- and
- a mirror plate connected to the hinge layer, the mirror plate having a first region over a second region, the first region having a greater amount of oxygen than the second region, wherein a degree of curvature of the mirror plate is based on a thickness of the first region.
Dependencies are inferred from the claim text.