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US 2024/0066341 A1Published application
Processing system and processing method
AssigneeTokyo Electron Limited
InventorShinji Kobayashi
Life of this patent
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Abstract
A PFAS detoxification system 1 includes a concentrator 11 configured to concentrate a waste liquid containing PFAS, discharged from a semiconductor manufacturing apparatus 100; a sulfuric acid processing tub 12 configured to decompose and evaporate a concentrated liquid concentrated by the concentrator 11 with a liquid containing concentrated sulfuric acid; and a cooling apparatus 13 configured to liquefy and collect a gas evaporated by the sulfuric acid processing tub 12.
Claims20
A processing system, comprising:
- a concentrating unit configured to concentrate a waste liquid containing an organic fluorine compound, discharged from a semiconductor manufacturing apparatus;
- a chemical liquid processing unit configured to decompose and evaporate a concentrated liquid concentrated by the concentrating unit with a liquid containing concentrated sulfuric acid;
- and
- a collecting unit configured to liquefy and collect a gas evaporated by the chemical liquid processing unit.
1 more element
A processing method, comprising:
- concentrating a waste liquid containing an organic fluorine compound, discharged from a semiconductor manufacturing apparatus;
- decomposing and evaporating a concentrated liquid concentrated in the concentrating of the waste liquid with a liquid containing concentrated sulfuric acid;
- and
- liquefying and collecting a gas evaporated in the decomposing and the evaporating of the concentrated liquid.
1 more element
Dependencies are inferred from the claim text.