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US 2024/0059981 A1Published application
Method for capturing silicon at low hourly space velocity
AssigneeIfp Energies Nouvelles
InventorsNicolas LEGAGNEUX, Marie-Claire MARION, Karin BARTHELET
Life of this patent
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Abstract
The present invention relates to a process for trapping silicon compounds in a gaseous or liquid feedstock, comprising bringing the feedstock into contact with a trapping mass with a liquid hourly space velocity LHSV of less than 5 h−1 or a gas hourly space velocity GHSV of less than 500 h−1.
Claims15
A process for trapping Silicon compounds in a gaseous or liquid feedstock, comprising bringing the feedstock into contact with a trapping mass with a liquid hourly space velocity LHSV of less than 5 h−1 or a gas hourly space velocity GHSV of less than 500 h−1.
Dependencies are inferred from the claim text.