Automatic pressure control device, film forming apparatus and pressure control method
AssigneeTokyo Electron Limited
InventorsSatoshi YONEKURA, Tamaki TAKEYAMA, Tatsuhiko TANIMURA, Shigeyuki OKURA
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AssigneeTokyo Electron Limited
InventorsSatoshi YONEKURA, Tamaki TAKEYAMA, Tatsuhiko TANIMURA, Shigeyuki OKURA
Estimating the term…
An automatic pressure control device that controls a pressure in a processing container to which a source gas for forming a film on a substrate is supplied, includes: a vacuum exhauster configured to vacuum-exhaust a gas in the processing container; an exhaust path connecting the processing container and the vacuum exhauster; and a butterfly valve including an annular valve seat having an inner wall surface and a valve body configured as a plate-shaped body. The valve body is rotatably installed to the valve seat via a shaft and configured to change an opening area of the exhaust path by being arranged to be inclined and changing an inclination angle of the valve body. The butterfly valve is configured to control the pressure in the processing container by changing the inclination angle of the valve body based on a result of detecting the pressure in the processing container.
An automatic pressure control device that controls a pressure in a processing container to which a source gas for forming a film on a substrate is supplied, the automatic pressure control device comprising:
A method of controlling a pressure in a processing container which is included in a film forming apparatus to which a source gas is supplied, the method comprising:
Dependencies are inferred from the claim text.