Interconnect with two-dimensional free zero line end enclosure
AssigneeInternational Business Machines Corporation
InventorsRuilong Xie, Albert M. Chu, Nicholas Anthony Lanzillo, Lawrence A. Clevenger, Huai Huang
Life of this patent
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Abstract
Embodiments of the invention include providing interconnects with two-dimensional free zero line end enclosure. A first metal line is formed. A second metal line is connected by a via to the first metal line, the first metal line having a first end with a zero line extension in relation to the via in a first dimension, the second metal line having another first end with a zero line extension in relation to the via in a second dimension perpendicular to the first dimension.
Claims20
An interconnect structure comprising:
- a first metal line;
- and
- a second metal line connected by a via to the first metal line, the first metal line having a first end with a zero line extension in relation to the via in a first dimension, the second metal line having another first end with another zero line extension in relation to the via in a second dimension perpendicular to the first dimension.
A method comprising:
- forming a first metal line;
- and
- forming a second metal line connected by a via to the first metal line, the first metal line having a first end with a zero line extension in relation to the via in a first dimension, the second metal line having another first end with another zero line extension in relation to the via in a second dimension perpendicular to the first dimension.
A method comprising:
- forming a merged via over a bottom metal line;
- forming top dummy lines;
- etching portions of the merged via unprotected by the top dummy lines resulting in self-aligned vias, the self-aligned vias being aligned to locations of the top dummy lines;
- cutting the bottom metal line according to a spacing between the top dummy lines;
- removing the top dummy lines;
- forming trenches adjacent to upper portions of the self-aligned vias, the trenches being formed in dielectric material;
- and
- forming top metal lines respectively in the trenches so as to be self-aligned to the self-aligned vias.
Dependencies are inferred from the claim text.