Substrate treating apparatus

A substrate treating apparatus that performs treatment on a substrate, the apparatus comprising:

• a batch-type processing unit configured to perform treatment on a plurality of substrates in a vertical posture collectively;
• a single-wafer-type processing unit configured to perform treatment on one substrate of the substrates in a horizontal posture;
• a posture turning unit configured to hold the substrates on which the treatment is performed by the batch-type processing unit, and to turn a posture of the substrates from vertical to horizontal;
• a first transport unit configured to transport the substrates, on which the treatment is performed by the batch-type processing unit, to the posture turning unit;
• a second transport unit configured to transport the substrates, turned to horizontal by the posture turning unit, to the single-wafer-type processing unit;
• and
• an immersion tank configured to accommodate the substrates whose posture is to be turned by the posture turning unit, and in which the substrates are immersed in deionized water before the posture is turned.