Polishing liquid composition for silicon oxide film

A polishing liquid composition for a silicon oxide film comprising:

• cerium oxide particles (component A);
• a water-soluble anionic condensate (component B);
• and
• an aqueous medium,
• wherein the component B is a co-condensate of monomers including a monomer (constituent monomer b1) represented by the following formula (I) and a monomer (constituent monomer b2) represented by the following formula (II), and
• a molar ratio (%) of the constituent monomer b1 to the total of the constituent monomer b1 and the constituent monomer b2 in the component B is more than 30%:
• in the formula (I), R1 and R2 are the same or different and represent a hydrogen atom, a hydrocarbon group having 1 to 4 carbon atoms, or —OM2, and M1 and M2 are the same or different and represent an alkali metal ion, an alkaline earth metal ion, an organic cation, ammonium (NH4+), or a hydrogen atom,
• in the formula (II), R3 and R4 are the same or different and represent a hydrogen atom, a hydrocarbon group having 1 to 4 carbon atoms, or —OM3, X represents —SO3M4 or —PO3M5M6, and M3, M4, M5, and M6 are the same or different and represent an alkali metal ion, an alkaline earth metal ion, an organic cation, ammonium (NH4+), or a hydrogen atom.