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US 2023/0420237 A1Published application
Sample support body, ionization method, and mass spectrometry method
AssigneeHamamatsu Photonics K.K.
InventorsMasahiro KOTANI, Takayuki OHMURA, Akira TASHIRO
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Abstract
A sample support body is used for ionizing a component of a sample. The sample support body includes: a substrate; a porous layer provided on the substrate and having a front surface on a side opposite to the substrate; and a partition portion partitioning the front surface into a first region and a second region. The porous layer includes a main body layer having a plurality of holes opening to the front surface. The partition portion includes a partition groove formed on the front surface so as to pass between the first region and the second region.
Claims14
1:
- A sample support body used for ionizing a component of a sample, the sample support body comprising:
- a substrate;
- a porous layer provided on the substrate and having a front surface on a side opposite to the substrate;
- and
- a partition portion partitioning the front surface into a first region and a second region, wherein
- the porous layer includes a main body layer having a plurality of holes opening to the front surface, and
- the partition portion includes a partition groove formed on the front surface so as to pass between the first region and the second region.
4 more elements
2:
- The sample support body according to claim 1, wherein a width of the partition groove is greater than a depth of the partition groove.
3:
- The sample support body according to claim 2, wherein
- the depth of the partition groove is 50 μm or more and 300 μm or less, and
- the width of the partition groove is at least twice the depth of the partition groove.
4:
- The sample support body according to claim 1, wherein the partition portion includes, as the partition groove, a part of an annular first partition groove surrounding the first region, a part of an annular second partition groove surrounding the second region, and a part of a third partition groove passing between the first partition groove and the second partition groove.
5:
- The sample support body according to claim 1, wherein
- the partition groove extends annularly,
- the first region is a region outside the partition groove, and
- the second region is a region inside the partition groove.
1 more element
6:
- The sample support body according to claim 1, further comprising a display portion where predetermined information is displayed,
- wherein the display portion includes a display groove formed on the front surface.
7:
- The sample support body according to claim 1, wherein
- the main body layer is an insulating layer, and
- the porous layer further includes a conductive layer formed along at least the front surface.
8:
- The sample support body according to claim 1, wherein
- the main body layer is an insulating layer, and
- the main body layer is exposed to an outside on at least the front surface.
9:
- The sample support body according to claim 7, wherein the substrate and the main body layer are formed by anodizing a surface layer of a metal substrate or a silicon substrate.
10:
- The sample support body according to claim 1, wherein the partition groove is formed on the front surface by the porous layer falling into a groove formed on a front surface of the substrate on the porous layer side.
11:
- An ionization method comprising:
- a step of preparing the sample support body according to claim 7;
- a step of disposing the sample to the front surface;
- and
- a step of ionizing the component by irradiating the front surface with an energy ray.
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12:
- An ionization method comprising:
- a step of preparing the sample support body according to claim 8;
- a step of disposing the sample to the front surface;
- and
- a step of ionizing the component by irradiating the front surface with a charged droplet.
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13:
- A mass spectrometry method comprising:
- the plurality of steps of the ionization method according to claim 11;
- and
- a step of detecting the ionized component.
1 more element
14:
- The sample support body according to claim 8, wherein the substrate and the main body layer are formed by anodizing a surface layer of a metal substrate or a silicon substrate.