Systems and methods for eliminating electromigration and self-heat violations in a mask layout block

A computer-implemented method of improving construction of a mask layout block, comprising:

• determining a selected position of a selected polygon;
• detecting intersecting line segments of the selected polygon including querying whether a first line segment and second line segment intersect;
• and
• determining that the first line segment and the second line segment intersect if endpoints of the first line segment are on opposite sides of the second line segment and endpoints of the second line segment are on opposite sides of the first line segment.

A computer-implemented method of improving construction of a mask layout block including performing a sweep line process to calculate intersections of lines, comprising:

• performing a binary search to insert a line segment in a status data structure;
• notifying neighbors of the line segment that they are no longer adjacent;
• deleting intersection points of the neighbors from a stopping points data structure;
• calculating intersections of the line segment with its neighbors and inserting the intersections into the stopping points data structure.