Multiple sources of signals for hybrid metrology using physical modeling and machine learning

A computer system configured for characterizing a structure on a sample comprising:

• at least one memory configured store measured signals, measurement results, a first physical model, a machine learning model, and parameters of interest for the structure;
• and
• at least one processor coupled to the at least one memory, wherein the at least one processor is configured to:
• obtain measured signals for the structure on the sample from a first metrology device;
• extract measurement results from a first physical model for the structure on the sample based on the measured signals;
• and
• determine parameters of interest for the structure on the sample with a machine learning model based on the measurement results extracted from the first physical model, and further based on at least one of:
• data from measured signals from the first metrology device not used in extracting the measurement results from the first physical model, second measured signals obtained for the structure on the sample from a second metrology device, process parameters used to generate the structure on the sample, Advanced Process Control (APC) parameters used to generate the structure on the sample, context data for the structure on the sample, and sensor data from production equipment used to generate the structure on the sample.

A system configured for characterizing a structure on a sample, comprising:

• means for obtaining measured signals for the structure on the sample from a first metrology device;
• means for extracting measurement results from a first physical model for the structure on the sample based on the measured signals;
• and
• means for determining parameters of interest for the structure on the sample with a machine learning model based on the measurement results extracted from the first physical model, and further based on at least one of:
• data from measured signals from the first metrology device not used in extracting the measurement results from the first physical model, second measured signals obtained for the structure on the sample from a second metrology device, process parameters used to generate the structure on the sample, Advanced Process Control (APC) parameters used to generate the structure on the sample, context data for the structure on the sample, and sensor data from production equipment used to generate the structure on the sample.