Light-source apparatus, inspection apparatus, and adjustment method

A light-source apparatus comprising:

• a first light source configured to generate visible light in a wavelength range of 466 nm to 472 nm;
• a first external resonator including a plurality of optical mirrors;
• a BBO crystal disposed in the first external resonator, capable of generating UV (UltraViolet) light in a wavelength range of 233 nm to 236 nm, the UV light being a second harmonic of the visible light;
• a one- or two-dimensional semiconductor sensor disposed near a far-field image plane formed through an optical element provided on an optical path of the UV light;
• a calculation unit configured to calculate a representative position of a light intensity distribution detected by the semiconductor sensor;
• a temperature control unit configured to adjust a temperature of the BBO crystal so that the representative position is confined within a predetermined range;
• a second light source configured to generate IR (InfraRed) light in a wavelength range of 1,071 nm to 1,138 nm;
• a second external resonator including a plurality of optical mirrors;
• a CLBO crystal disposed in the second external resonator and capable of generating deep UV light having a wavelength of about 193 nm, the deep UV light being sum-frequency-mixed light of the UV light and the IR light;
• a condensing lens configured to concentrate the UV light in the CLBO crystal;
• and
• a beam splitter disposed between the condensing lens and the CLBO crystal, configured to take out UV light incident on the semiconductor sensor, wherein
• an initial value of the representative position is set so that an output of the deep UV light is maximized.