Tool for preventing or suppressing arcing
AssigneeLam Research Corporation
InventorsYukinori SAKIYAMA, Karl Frederick LEESER, Vincent BURKHART
Life of this patent
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Abstract
A tool that suppresses or altogether eliminates arcing between a substrate pedestal and substrate is disclosed. The tool includes a processing chamber, a substrate pedestal for supporting a substrate within the processing chamber, and shower head positioned within the processing chamber. The shower head is arranged to dispense gas that is turned into a plasma, which develops a DC self-bias potential on the substrate surface. The tool also includes a bias control system configured to induce a DC potential to the substrate at a deliberate target electrical potential.
Claims19
1-20. (canceled)
An apparatus for preventing or suppressing arcing, comprising
- a processing chamber;
- a substrate pedestal for supporting a substrate within the processing chamber;
- a shower head positioned within the processing chamber, the shower head arranged to dispense gas that is turned into a plasma within the processing chamber, the plasma developing a DC self-bias potential on the substrate surface;
- and
- a bias control system configured to induce a DC potential to the substrate at a deliberate, target electrical potential.
Dependencies are inferred from the claim text.