Composition, method for manufacturing semiconductor substrate, polymer, and method for manufacturing polymer

A polymer comprising a repeating unit represented by formula (1),

• wherein, in the formula (1), Ar1 is a divalent group comprising an aromatic ring having 5 to 40 ring atoms;
• and R0 is a group represented by formula (1-1) or (1-2),
• wherein, in the formulas (1-1) and (1-2), X1 and X2 are each independently a group represented by formula (i), (ii), (iii) or (iv);
• * is a bond with the carbon atom in the formula (1);
• and Ar2, Ar3 and Ar4 are each independently a substituted or unsubstituted aromatic ring having 6 to 20 ring atoms that forms a fused ring structure together with the two adjacent carbon atoms in the formulas (1-1) and (1-2),
• wherein,
• in the formula (i), R1 and R2 are each independently a hydrogen atom or a monovalent organic group having 1 to 20 carbon atoms;
• in the formula (ii), R3 is a hydrogen atom or a monovalent organic group having 1 to 20 carbon atoms;
• R4 is a monovalent organic group having 1 to 20 carbon atoms;
• in the formula (iii), R5 is a monovalent organic group having 1 to 20 carbon atoms;
• and
• in the formula (iv), R6 is a hydrogen atom or a monovalent organic group having 1 to 20 carbon atoms.

A method for producing a polymer comprising:

• reacting a first compound comprising an aromatic ring having 5 to 40 ring atoms with a second compound represented by formula (4-1), (4-2), (4-3) or (4-4),
• wherein, in the formula (4-1), R0a is a group represented by formula (1-1) or (1-2),
• wherein, in the formulas (1-1) and (1-2), X1 and X2 are each independently a group represented by formula (i), (ii), (iii) or (iv);
• * is a bond with the carbon atom in the formula (4-1);
• and Ar2, Ar3 and Ar4 are each independently a substituted or unsubstituted aromatic ring having 6 to 20 ring atoms that forms a fused ring structure together with the two adjacent carbon atoms in the formulas (1-1) and (1-2),
• wherein,
• in the formula (i), R1 and R2 are each independently a hydrogen atom or a monovalent organic group having 1 to 20 carbon atoms;
• in the formula (ii), R3 is a hydrogen atom or a monovalent organic group having 1 to 20 carbon atoms;
• R4 is a monovalent organic group having 1 to 20 carbon atoms;
• in the formula (iii), R5 is a monovalent organic group having 1 to 20 carbon atoms;
• and
• in the formula (iv), R6 is a hydrogen atom or a monovalent organic group having 1 to 20 carbon atoms,
• wherein, in the formula (4-2), R0a is as defined in the formula (4-1);
• and Rx1 and Rx2 are each independently a monovalent hydrocarbon group having 1 to 10 carbon atoms,
• wherein, in the formula (4-3), R0a is as defined in the formula (4-1);
• and Rx3 is a divalent hydrocarbon group having 1 to 10 carbon atoms,
• wherein, in the formula (4-4), R0a′ is a divalent organic group which is obtained by removing one hydrogen atom from the group represented by R0a in the formula (4-1);
• and Rx4 is a monovalent hydrocarbon group having 1 to 10 carbon atoms.