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US 2023/0416095 A1Published application
Nanomaterial manufacturing methods
AssigneeCVD Equipment Corporation
InventorsMaxim S. Shatalov, Samuel J. Wright, Mikhail Gaevski
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Abstract
Methods permit the growth of two or more nanomaterials in a common process chamber in the same batch run, either simultaneously or sequentially, using one or a combination of CVD, CVI, or other techniques. The methods described can be beneficial for forming nanosilicon-containing nanocarbon structures suitable for use as a battery anode material.
Claims19
A method for growing nanomaterials comprising:
- loading a catalytically active substrate into a process chamber;
- introducing first treatment gases/vapors into the process chamber to make a treated substrate;
- depositing catalytic materials on the treated substrate while it remains in the process chamber;
- and
- exposing the catalytically activated treated substrate to second treatment gases/vapors to create a nanostructure composite.
2 more elements
A method comprising:
- depositing, via chemical vapor deposition (CVD), carbon nanotubes (CNTs) on a substrate having a first metal or metal oxide catalyst layer to provide a CNT-containing substrate;
- depositing a second metal or metal oxide catalyst layer suitable for SiNW deposition onto the CNT-containing substrate to provide a catalytically active CNT-containing substrate;
- depositing, via CVD, SiNW onto the catalytically active CNT-containing substrate to provide a SiNW-coated catalytically active CNT-containing substrate;
- and
- at least partially encapsulating, via chemical vapor infiltration, the SiNW-coated catalytically active CNT-containing substrate with carbon to provide a composite structure having substantial void space therein.
2 more elements
A method comprising:
- depositing at least one of SiNW or CNT onto a substrate using one or more liquid catalyst precursors,
- wherein the liquid catalyst precursor is copper catalyst for SiNW deposition, and
- wherein the liquid catalyst precursor is ferrocene (Fe(C5H5)2) for CNT deposition.
A method comprising:
- positioning a substrate within a single process chamber;
- and
- depositing a metal-based or metal oxide-based catalyst layer onto the substrate while the substrate is within the process chamber, the catalyst layer suitable for chemical vapor deposition (CVD) of carbon nanotubes (CNTs), SiNW, or both.
Dependencies are inferred from the claim text.