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AssigneeCanon Kabushiki Kaisha
InventorHiroshi Sato
Estimating the term…
An imprint system transfers a pattern formed on a mold to an imprint material supplied onto a substrate and includes: a formation unit configured to form a desired substrate-side mark including a predetermined material by applying the predetermined material onto the surface of the substrate and then transferring the substrate-side mark on the predetermined material and processing the substrate-side mark, wherein a difference in a predetermined optical property between the predetermined material and the imprint material is larger than a difference in the predetermined optical property between the imprint material and the substrate; and an alignment unit configured to align the substrate-side mark including the predetermined material and a mold-side mark provided on the mold.
An imprint system transferring a pattern formed on a mold to an imprint material supplied onto a substrate, the imprint system comprising at least one processor or circuit configured to function as:
A substrate that is used for an imprint system configured to align a substrate-side mark and a mold-side mark when a pattern formed on a mold is transferred to an imprint material supplied on a substrate,
An imprint method having an imprinting process of transferring a pattern formed on a mold to an imprint material supplied onto a substrate, the imprint method comprising:
A replica mold manufacturing method comprising:
An article manufacturing method comprising:
Dependencies are inferred from the claim text.