Method for producing light-emitting element, and light-emitting element
AssigneeSharp Kabushiki Kaisha
InventorsTakahiro ADACHI, JUN SAKUMA
Life of this patent
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Abstract
A method for manufacturing a light-emitting element includes forming a first light-emitting layer by applying a first quantum dot solution containing first quantum dots, forming a first resist layer by applying a first photosensitive resin composition onto the first light-emitting layer, exposing the first resist layer to light in a predetermined pattern, and performing a pattern formation of developing the first resist layer with a developing solution to form a patterned first resist layer, and processing the first light-emitting layer with a treatment liquid using the patterned first resist layer as a mask to form a patterned first light-emitting layer.
Claims14
A method for manufacturing a light-emitting element, the method comprising:
- forming a first light-emitting layer by applying a first quantum dot solution containing first quantum dots;
- forming a first resist layer by applying a first photosensitive resin composition onto the first light-emitting layer;
- exposing the first resist layer to light in a predetermined pattern;
- and
- performing a pattern formation of developing the first resist layer with a developing solution to form a patterned first resist layer, and processing the first light-emitting layer with a treatment liquid using the patterned first resist layer as a mask to form a patterned first light-emitting layer.
A method for manufacturing a light-emitting element, the method comprising:
- forming a lift-off resist layer by applying a positive photosensitive resin composition;
- exposing the lift-off resist layer to light in a predetermined pattern;
- developing the lift-off resist layer to form a patterned lift-off resist layer;
- applying a first quantum dot solution containing first quantum dots onto the patterned lift-off resist layer to form a first light-emitting layer;
- applying a negative photosensitive resin composition onto the first light-emitting layer to form a first resist layer;
- and
- performing a pattern formation of exposing an entire surface of the first resist layer to light, and then lifting off the first light-emitting layer and the first resist layer formed on the patterned lift-off resist layer by processing the patterned lift-off resist layer with a developing solution to pattern the first light-emitting layer and the first resist layer.
14-19. (canceled)
Dependencies are inferred from the claim text.