Color conversion substrate, display device including the same, and method of manufacturing color conversion substrate
AssigneeSamsung Display Co., Ltd.
InventorsRAN KIM, KIHYUN KIM, YOUNGGIL PARK
Life of this patent
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Abstract
A color conversion substrate includes a base substrate, a color filter layer on the base substrate, a low refractive index layer on the color filter layer, a capping layer on the low refractive index layer, where the capping layer includes a first capping film including silicon oxynitride (SiOxNy) having a nitrogen content in a range of about 10 at % to about 35 at %, a bank on the capping layer, where an opening defining a plurality of pixels is defined in the bank, and a color conversion layer on the capping layer in the opening.
Claims33
A color conversion substrate comprising:
- a base substrate;
- a color filter layer on the base substrate;
- a low refractive index layer on the color filter layer;
- a capping layer on the low refractive index layer, wherein the capping layer includes a first capping film including silicon oxynitride (SiOxNy) having a nitrogen content in a range of about 10 at % to about 35 at %;
- a bank on the capping layer, wherein an opening defining a plurality of pixels is defined in the bank;
- and
- a color conversion layer on the capping layer in the opening.
A display device comprising:
- a first base substrate;
- a second base substrate which faces the first base substrate;
- a sealing member between the first base substrate and the second base substrate;
- a color filter layer under the first base substrate;
- a bank under the color filter layer, wherein an opening defining a plurality of pixels is defined in the bank;
- a plurality of light emitting diodes on the second base substrate, wherein the plurality of light emitting diodes overlaps the plurality of pixels, respectively;
- a color conversion layer on the plurality of light emitting diodes in the opening;
- a low refractive index layer under the color filter layer, and on the color conversion layer and the bank;
- and
- a capping layer under the low refractive index layer, and on the color conversion layer and the bank, wherein the capping layer includes a first capping film including silicon oxynitride (SiOxNy) having a nitrogen content in a range of about 10 at % to about 35 at %.
A method of manufacturing a color conversion substrate, the method comprising:
- providing a color filter layer on a base substrate;
- providing a low refractive index layer on the color filter layer;
- providing a capping layer including silicon oxynitride (SiOxNy) having a nitrogen content in a range of about 10 at % to about 35 at % on the low refractive index layer;
- providing a bank on the capping layer;
- forming an opening defining a plurality of pixels by patterning the bank;
- and
- providing a color conversion layer on the capping layer in the opening.
Dependencies are inferred from the claim text.