Microphone assembly with particle filtration system
AssigneeLouchen IP, LLC
InventorBrian A. Loudenslager
Life of this patent
Estimating the term…
Abstract
A microphone assembly having a particle filtration system. The microphone filtration system may include an outer support structure, at least one filtration layer, an inner support structure, and a sleeve. The microphone filtration system is configured to seal a transducer chamber of the microphone assembly from the outside environment, and trap particles that may buildup and corrode a transducer housed by the transducer chamber. The at least one filtration layer of the particle filtration system provides a Minimum Efficient Reporting Value (MERV) rating greater than or equal to 13 while minimizing attenuation and distortion of the soundwaves entering the transducer chamber.
Claims20
A microphone assembly comprising:
- a transducer configured to convert air pressure variations of sound waves into electrical signals;
- a transducer chamber configured to house the transducer;
- and
- a particle filtration system, wherein the particle filtration system comprises:
- an outer support structure having a porosity of less than or equal to about fifty-five pores per square inch (55 PPI),
- a filtration layer, wherein the filtration layer is housed by the outer support structure, wherein the filtration layer includes at least one member of a group consisting of at least one layer of an electrostatic media filter, at least one layer of an activated carbon filter, and at least one layer of a nonwoven fabric filter,
- a sleeve disposed between the filtration layer and the transducer chamber, the sleeve configured to grip the filtration layer and prevent the filtration layer from sliding from the transducer chamber,
- wherein the filtration layer provides a Minimum Efficient Reporting Value (MERV) rating greater than or equal to thirteen (13), and the filtration layer traps at least fifty-percent (50%) of particles between 0.3 μm and 1 μm, more than or equal to about eighty-five percent (85%) of particles between 1 μm and 3 μm and more than or equal to about ninety percent (90%) of particles between 3 μm and 10 μm.
A particle filtration system for a microphone assembly comprising:
- an outer support structure;
- at least one filtration layer housed by the outer support structure, wherein the at least one filtration layer includes at least one member of a group consisting of:
- at least one layer of an electrostatic media filter, at least one layer of an activated carbon filter, and at least one layer of a nonwoven fabric filter, the at least one filtration layer configured to filter particles from entering into a transducer chamber;
- and
- a sleeve disposed between the at least one filtration layer and the transducer chamber, the sleeve configured to grip the at least one filtration layer and prevent the at least one filtration layer from sliding from the transducer chamber,
- wherein the at least one filtration layer provides a Minimum Efficient Reporting Value (MERV) rating greater than or equal to thirteen (13), and the filtration layer traps at least fifty-percent (50%) of particles between 0.3 μm and 1 μm, more than or equal to about eighty-five percent (85%) of particles between 1 μm and 3 μm and more than or equal to about ninety percent (90%) of particles between 3 μm and 10 μm.
A particle filtration system for a microphone assembly comprising:
- a filtration layer configured to filter particles from entering into a transducer chamber;
- and
- a sleeve disposed between the at least one filtration layer and the transducer chamber, the sleeve configured to grip the filtration layer and prevent the filtration layer from sliding from the transducer chamber,
- wherein the filtration layer provides a Minimum Efficient Reporting Value (MERV) rating greater than or equal to thirteen (13), and the filtration layer traps at least fifty-percent (50%) of particles between 0.3 μm and 1 μm, more than or equal to about eighty-five percent (85%) of particles between 1 μm and 3 μm and more than or equal to about ninety percent (90%) of particles between 3 μm and 10 μm.
Dependencies are inferred from the claim text.