Applying system, applying support method, and storage medium
AssigneeCasio Computer Co., Ltd.
InventorShuichi YAMASAKI
Life of this patent
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Abstract
An applying system includes the following. A drying apparatus dries a first applying material applied to a surface of a nail. An applying apparatus applies a second applying material on the surface of the nail with the first applying material dried by the drying apparatus in between.
Claims20
An applying system comprising:
- a drying apparatus that dries a first applying material applied to a surface of a nail;
- and
- an applying apparatus that applies a second applying material on the surface of the nail with the first applying material dried by the drying apparatus in between.
An applying support method that is performed by an applying system including an applying apparatus and a drying apparatus, the method comprising:
- drying with the drying apparatus a first applying material applied on a surface of a nail by the applying apparatus;
- and
- applying a second applying material with the applying apparatus on the surface of the nail with the first applying material dried by the drying apparatus in between.
A non-transitory computer-readable storage medium having a program stored thereon for controlling a computer in an applying system provided with a drying apparatus and an applying apparatus, the program controlling the computer to perform,
- a display control process in which, after waiting until a timing or a planned timing that a first applying material applied on a surface of a nail by the applying apparatus completes drying by the drying apparatus, a guidance display displayed on a display is switched to the guidance display to guide a user to apply a second applying material on the surface of the nail by the applying apparatus.
Dependencies are inferred from the claim text.