Photoresist composition and method of manufacturing a semiconductor device

A photoresist composition, comprising:

• an organometallic monomer comprising:
• a metal core;
• a first photo-cleavable ligand;
• and
• a second non-photo-cleavable ligand having a crosslinking group;
• or
• a polymer including:
• a monomer unit having a pendant sensitizer group selected from the group consisting of a phenyl group, a naphthalenyl group, a phenanthrenyl group, an anthracenyl group, a phenalenyl group, and a three- to five-membered ring, and
• a crosslinking group bonded to the sensitizer, wherein the crosslinking group is one or more of a C2-C30 aliphatic or aromatic group having a functional group selected from the group consisting of an epoxy group, an azo group, an alkyl halide group, an imine group, an alkene group, an alkyne group, a peroxide group, a ketone group, an aldehyde group, an allene group, or a heterocyclic group;
• and
• a monomer unit having a pendant acid labile group;
• and
• a photoactive compound,

A photoresist composition, comprising:

• a polymer,
• wherein the polymer comprises:
• a monomer unit having a pendant sensitizer selected from the group consisting of a substituted or unsubstituted aromatic group and a substituted or unsubstituted heterocyclic group,
• a crosslinking group bonded to the sensitizer, wherein the crosslinking group is selected from the group consisting of and the crosslinking group is one or more of a C2-C30 aliphatic or aromatic group having a functional group selected from the group consisting of an epoxy group, an azo group, an alkyl halide group, an imine group, an alkene group, an alkyne group, a peroxide group, a ketone group, an aldehyde group, an allene group, or a heterocyclic group;
• a monomer unit having a pendant organic group, wherein the pendant organic group is an unsubstituted C1-C30 group or a C1-C30 group substituted with one or more of —I, —Br, —Cl, —F, —NH2, —COOH, —OH, —SH, —N3, —S(═O)—, an alkene group, an alkyne group, an imine group, an ether group, an ester group, an aldehyde group, a ketone group, an amide group, a sulfone group, an acetic acid group, a carboxylic acid group, or a cyanide group;
• and
• a monomer unit having a pendant acid labile group;
• and
• a photoacid generator.