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US 2023/0408917 A1Published application
Resist composition and method for forming resist pattern
AssigneeTokyo Ohka Kogyo Co., Ltd.
InventorsTakatoshi Inari, Masatoshi Arai, Yoshitaka Komuro
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Abstract
A resist composition containing a metal compound, in which a structure of the metal compound is changed upon exposure, and the metal compound exhibits changed solubility in a developing solution, in which the metal compound includes a cubane-structured metal oxide.
Claims5
A resist composition, comprising:
- a metal compound,
- wherein a structure of the metal compound is changed upon exposure, and the metal compound exhibits changed solubility in a developing solution, and
- the metal compound includes a cubane-structured metal oxide.
Dependencies are inferred from the claim text.