# US 2023/0408902 A1 · Method for manufacturing a set of electronic components on the front of a semiconductor substrate > Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt - Number: US 2023/0408902 A1 - Document ID: US20230408902A1 - Status: Published application - Kind: A1 - Application number: 18/247,872 - Filed: 2021-10-18 - Published: 2023-12-21 - Earliest claimed: 2020-10-16 - Assignees: Exagan - Applicants: Exagan - Inventors: Matthieu NONGAILLARD; Thomas OHEIX - Web page: https://patentgrep.com/patent/US20230408902A1 ## CPC - G03F 1/38: Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof - G03F 7/70683: {Mark designs} - H10W 46/00: Marks applied to devices, e.g. for alignment or identification - H10W 46/301: {for alignment} - G03F: PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices B41B; photosensitive materials or processes for photographic purposes G03C; electrophotography, sensitive layers or processes therefor G03G) - H10W: GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10 ## Abstract The invention concerns a method of manufacturing an assembly of electronic components on a front surface of a semiconductor substrate comprising a plurality of field areas, each field area comprising at least one field and each field comprising at least one electronic component, the method comprising a plurality of photolithography steps to form a stack of layers forming each electronic component, each photolithography step defining a mask level and comprising the application of a mask successively on each field in photolithography equipment, the positioning of said mask on each field being performed relative to a reference mask level, one of the masks being designated as identification mask. The manufacturing method is remarkable in that: at the photolithography step defining a mask level associated with the identification mask, said mask is positioned with a predetermined offset with respect to the reference mask level, the offset being different for each field area, the electronic component(s) of a field area have an identification element appearing as a predetermined offset between a pattern defined at the reference mask level and a pattern defined at the identification mask level. ## Claims ### Claim 1 A method, comprising: manufacturing an assembly of electronic components on a front surface of a semiconductor substrate that includes a plurality of field areas, each field area including at least one field and each field including at least one electronic component, the manufacturing including: performing a first photolithography step for an opening of contacts of electronic components; performing a second plurality of photolithography steps forming a stack of layers forming each electronic component, each second photolithography step defining a mask level and applying a mask successively on each field in photolithography equipment, a positioning of the mask on each field being performed relative to a reference mask level, one of the masks being an identification mask, the performing including: applying the mask that corresponds to identification mask at the first photolithography step for the opening of contacts; at the first photolithography step for the opening of contacts, defining a mask level that corresponds to the identification mask, positioning the identification mask with a predetermined offset with respect to the reference mask level, the offset being different for each field area, the electronic component(s) of a field area exhibit an identification element appearing as the predetermined offset between a pattern defined at the reference mask level and a pattern defined at the identification mask level. ### Claim 2 (depends on 1) The manufacturing method according to claim 1, wherein the predetermined offset varies between a minimum optically-detectable offset and a maximum offset that degrades the performance of the electronic components. ### Claim 3 (depends on 2) The manufacturing method according to claim 2, wherein the predetermined offset comprises a first offset amplitude along a first axis of a main plane parallel to the front surface of the substrate, and a second offset amplitude along a second axis of the main plane. ### Claim 4 (depends on 1) The manufacturing method according to claim 1, wherein the reference mask level is defined by a third photolithography step, prior to the first photolithography step for the opening of contacts, for the forming of a last metallization layer of the stack of layers forming each electronic component. ### Claim 5 (depends on 1) The manufacturing method according to claim 1, wherein the predetermined offset has a first offset amplitude and a second offset amplitude, in the range from 1 μm to 100 μm. ### Claim 6 (depends on 1) The manufacturing method according to claim 1, wherein each field area comprises a single field. ### Claim 7 (depends on 1) The manufacturing method according to claim 1, wherein each field comprises a single electronic component. ### Claim 8 (depends on 1) The manufacturing method according to claim 1, wherein the electronic components comprise high electron mobility transistors based on III-N materials. ### Claim 9 A method, comprising: forming plurality of electronic components on a semiconductor substrate, each component including an identification element that enables, after singulation of the components, to identify back a location of the components on the substrate, the substrate includes a first area having a first field, a second area having a plurality of second fields, and a third area having a plurality of third fields, the forming the plurality of electric components including: forming a stack of layers with a plurality of photolithography steps in photolithography equipment; for each first photolithography step, applying a mask successively on each of the first field, the plurality of second fields, and the plurality of third fields; forming an identification mask with a plurality of offsets with respect to a references mask, each offset being different for each of the first, second, and third fields. ### Claim 10 (depends on 9) The method of claim 9, wherein forming the identification mask includes forming a second photolithography step that is after the first photolithography steps. ### Claim 11 (depends on 10) The method of claim 10, wherein forming the identification mask includes forming a plurality of contact openings with each of the plurality of electronic components. ### Claim 12 (depends on 11) The method of claim 11, wherein each offset is in the range of 1 micrometer and 100 micrometers. ### Claim 13 (depends on 9) The method of claim 9, wherein the first field, each of the plurality of second fields, and each of the plurality of third fields are each a single electronic component. ### Claim 14 (depends on 13) The method of claim 13, wherein each of the plurality of the second fields is a first type of electronic component and the first field is a second type of electronic component. ### Claim 15 (depends on 14) The method of claim 14, wherein the plurality of third fields are a third type of electronic component.