Semiconductor structure and method of manufacturing the same

A semiconductor structure, comprising:

• a dielectric layer;
• a first waveguide structure, disposed in the dielectric layer and extending along a first direction;
• a second waveguide structure, disposed in the dielectric layer and including an inclined surface configured to change a traveling direction of an optical signal from a second direction to the first direction;
• a semiconductive layer, disposed over the dielectric layer;
• and
• a micro-lens, disposed at the semiconductive layer,
• wherein an optical signal travels into the semiconductive layer through the micro-lens along the second direction.

A method of manufacturing a semiconductor structure, comprising:

• forming a first dielectric layer over a substrate;
• removing a portion of the first dielectric layer thereby forming an inclined member;
• forming a reflective layer over the inclined member, wherein the reflective layer includes an inclined surface conformal to the inclined member;
• forming a waveguide structure adjacent to the inclined surface of the reflective layer;
• and
• forming a second dielectric layer covering the reflective layer and the waveguide structure.