Optical diffuser and its method of manufacture
AssigneeSTMicroelectronics (Crolles 2) SAS
InventorsVincent FARYS, Alain INARD, Olivier NOBLANC
Life of this patent
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Abstract
Methods of manufacture of an optical diffuser. In one embodiment, an optical diffuser is formed by providing a wafer including a silicon slice of which an upper face is covered with a first layer made of a first material itself covered with a second layer made of a second selectively etchable material with respect to the first material. The method further includes forming openings in the second layer extending up to the first layer and filling the openings in the second layer with a third material. The method yet further includes bonding a glass substrate to the wafer on the side of its upper face and removing the silicon slice.
Claims21
(canceled)
A method of forming an optical passive device, comprising:
- forming a first layer, which includes a first material, on a wafer;
- forming a second layer, which includes a second material, on the first layer;
- forming a masking layer on the second layer, the masking layer having a plurality of openings;
- forming a plurality of openings in the second layer through the plurality of openings in the masking layer;
- filling the plurality of openings in the second layer with a third layer, which includes a third material;
- forming a fourth layer, which includes the second material, on masking layer, the fourth layer having a plurality of openings;
- and
- filling the plurality of openings in the fourth layer with a fifth layer, which includes the third material.
An optical passive device, comprising:
- a first layer of a first material;
- a second layer, which includes a second material, on the first layer, the second layer having a plurality of openings;
- a masking layer on the second layer, the masking layer having a plurality of openings;
- a third layer, which includes a third material, in the plurality of openings in the second layer;
- a fourth layer, which includes the second material, on masking layer, the fourth layer having a plurality of openings;
- and
- a fifth layer, which includes the third material, in the plurality of openings in the fourth layer.
A method, comprising:
- forming a first layer, which includes a first material;
- forming a second layer, which includes a second material, on the first layer;
- forming a plurality of openings in the second layer with a masking layer;
- forming a third layer, which includes a third material, in the plurality of openings in the second layer;
- forming a fourth layer, which includes the second material, on masking layer, the fourth layer having a plurality of openings;
- and
- forming a fifth layer, which includes the third material, in the plurality of openings in the fourth layer.
Dependencies are inferred from the claim text.