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US 2023/0407475 A1Published application
Fully open-air combustion deposition and rapid plasma treatment of metal oxides
AssigneeThe Board of Trustees of the Leland Stanford Junior University
InventorsReinhold H. Dauskardt, Thomas W. Colburn, Robert D. Miller, Nicholas Rolston
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Abstract
Fabrication of thin-film metal oxide layers is performed by combining deposition of an oxidant-containing precursor, combustion of the precursor to form a thin-film metal oxide layer, and plasma treating the thin-film metal oxide layer. In one example, rapid fabrication of high-quality indium tin oxide thin films is demonstrated.
Claims22
A method of making a thin-film metal oxide layer, the method comprising:
- depositing a precursor on a substrate, wherein the precursor includes
- i) at least one metallic oxidant salt species or a combination of a metallic non-oxidant salt species with a non-metallic oxidant species, and
- ii) at least one organic complexing fuel species;
- combusting the precursor to form a thin-film metal oxide layer, wherein oxygen for the thin-film metal oxide layer comes at least in part from oxidant in the precursor;
- and
- plasma treating the thin-film metal oxide layer with an open-air plasma to provide a plasma-treated thin-film metal oxide layer.
3 more elements
Dependencies are inferred from the claim text.