Uv-curable resins for chemical mechanical polishing pads
AssigneeCMC Materials, Inc.
InventorPing HUANG
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Abstract
The invention provides a composition for preparing a chemical-mechanical polishing pad via photopolymerization, comprising one or more acrylate urethane oligomers, one or more acrylate monomers and at least one photo-polymerization initiator. The invention also provides a method of forming a chemical-mechanical polishing pad comprising; preparing composition comprising one or more acrylate urethane oligomers, one or more acrylate monomers and at least one photo-polymerization initiator. The method further comprising exposing at least a layer of the composition to ultraviolet light, thereby initiating a polymerization reaction and thus forming at least a layer of solidified pad material.
Claims20
A composition for preparing a chemical-mechanical polishing pad via photopolymerization, the composition comprising:
- one or more acrylate urethane oligomers;
- one or more acrylate monomers;
- and
- at least one photo-polymerization initiator.
A method of forming a chemical-mechanical polishing pad comprising:
- preparing a composition comprising:
- one or more acrylate urethane oligomers;
- one or more acrylate monomers;
- and
- at least one photo-polymerization initiator;
- and
- exposing at least a layer of the composition to ultraviolet light, thereby initiating a polymerization reaction and thus forming at least a layer of solidified pad material.
Dependencies are inferred from the claim text.