Display device, method of fabricating the same

A method of fabricating a display device, the method comprising:

• preparing a substrate comprising emission areas for displaying images, and a non-emission area between the emission areas;
• locating a circuit layer comprising pixel drivers respectively associated with the emission areas above the substrate;
• locating anode electrodes respectively in the emission areas above the circuit layer;
• locating a bank buffer layer covering the anode electrodes above the circuit layer;
• locating a first multi-layer comprising a stack of two or more different metal materials above the bank buffer layer;
• locating a pixel-defining layer in the non-emission area above the first multi-layer;
• locating a second multi-layer covering the pixel-defining layer and comprising a stack of two or more different metal materials above the first multi-layer;
• locating a spacer in at least a part of the non-emission area above the second multi-layer;
• patterning the bank buffer layer, the first multi-layer, and the second multi-layer using the pixel-defining layer and the spacer as masks;
• transforming the patterned first multi-layer and the patterned second multi-layer into respective undercut structures to expose central portions of the anode electrodes;
• locating first common layers and emissive layers respectively in the emission areas above the anode electrodes;
• locating a second common layer and a cathode electrode covering the emissive layers, the pixel-defining layer, and the spacer in the emission areas and the non-emission area;
• and
• locating an encapsulation structure above the cathode electrode.