System, devices and methods for electron beam for plasma heating
AssigneeTae Technologies, Inc.
InventorsAnton Tkachev, Sergey Korepanov
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Abstract
A long-pulse, high power electron beam with plasma emitters for plasma heating. The electron beam includes an arc plasma source, an electron optical system comprised of the system of acceleration grids, a beamline which includes a magnetic system to provide effective e-beam formation, transport and, ultimately, injection into a plasma confinement device of interest, a plasma generator coil, a plasma emitter coil, a lens coil, and a beam transport coil.
Claims20
A method for generating and maintaining a field reversed configuration (FRC) plasma comprising the steps of:
- forming an FRC about a plasma within in a confinement chamber,
- axially injecting an electron beam from an electron beam source into the FRC plasma, and
- maintaining the FRC plasma at or about a constant value without decay by injecting beams of fast neutral atoms from neutral beam injectors into the FRC plasma at an angle towards the mid-plane of the confinement chamber.
A system for generating and maintaining a field reversed configuration (FRC) plasma comprising
- a confinement chamber,
- first and second divertors coupled to the first and second formation sections,
- first and second axial plasma guns operably coupled to the first and second divertors, the first and second formation sections and the confinement chamber,
- a plurality of neutral atom beam injectors coupled to the confinement chamber and oriented to inject neutral atom beams toward a mid-plane of the confinement chamber at an angle less than normal to a longitudinal axis of the confinement chamber,
- a magnetic system comprising a plurality of quasi-dc coils positioned around the confinement chamber, the first and second formation sections, and the first and second divertors, first and second set of quasi-dc mirror coils positioned between the confinement chamber and the first and second formation sections, and first and second mirror plugs position between the first and second formation sections and the first and second divertors,
- a gettering system coupled to the confinement chamber and the first and second divertors,
- one or more biasing electrodes for electrically biasing open flux surface of a generated FRC, the one or more biasing electrodes being positioned within one or more of the confinement chamber, the first and second formation sections, and the first and second divertors,
- two or more saddle coils coupled to the confinement chamber, and
- one or more electron beams axially coupled to one or more of the first and second divertors.
21-33. (canceled)
Dependencies are inferred from the claim text.