A device for cleaning a pot-shaped hollow body, in particular transport containers for semiconductor wafers or for EUV lithography masks, the hollow body comprising:
- a base wall and a side wall that forms an inner hollow body surface;
- an opening that is disposed opposite the base wall and that is proximate a marginal surface of the side wall;
- a support wall on which the marginal surface of the hollow body can be placed;
- a locking device by which the hollow body is sealingly connectable to the marginal surface and releasably connectable to the support wall;
- a passage opening that is formed by the support wall and that is arranged radially inwardly from the locking device;
- a cleaning device by which a first cleaning fluid for cleaning the inner hollow body surface can be dispensed when the hollow body is connected to the support wall;
- and
- a first drainage channel having a first end, wherein the first end of the first drainage channel is only in fluid communication with the passage opening and by which the first cleaning fluid dispensed by the cleaning device can be drained, wherein the cleaning device has a first cleaning head that projects over the passage opening and the first cleaning head has a number of first cleaning nozzles by which the first cleaning fluid can be dispensed at a spray angle, wherein the first cleaning head has a setting device by which the spray angle can be set.