Carrier ring for floating tcp chamber gas plate

A processing chamber for a substrate processing system configured to perform transformer coupled plasma processing, the processing chamber comprising:

• a recess defined in an upper portion of the processing chamber;
• a carrier ring arranged in the recess, wherein the carrier ring includes an annular body and a radially inwardly projecting portion, wherein the radially inwardly projection portion has a first inner diameter, wherein the annular body has a second inner diameter greater than the first inner diameter, and wherein the projection portion define a ledge;
• a gas plate arranged on the ledge of the carrier ring, wherein the gas plate includes a plurality of holes configured to supply a gas mixture into an interior of the processing chamber;
• and
• a dielectric window arranged on the gas plate above the gas plate and the carrier ring such that the gas plate is supported between the carrier ring and the dielectric window,
• wherein the gas plate is not in direct contact with the upper portion of the processing chamber.