Vacuum Treatment Apparatus and Vacuum Treatment Method
AssigneeHitachi High-Tech Corporation
InventorsAkito TANOKUCHI, Hiroki TSUBOUCHI, Takao UBUKATA
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AssigneeHitachi High-Tech Corporation
InventorsAkito TANOKUCHI, Hiroki TSUBOUCHI, Takao UBUKATA
Estimating the term…
Provided are a vacuum treatment device and a vacuum treatment method with which it is possible to suppress deterioration of the degree of vacuum in a conveyance destination vacuum chamber when conveying a sample between two vacuum chambers. In this regard, a control device 30 controls conveyance of a wafer 600 from LC 102 to SC 101 via a LC-SC gate valve 510. At this time, the control device stops vacuum evacuation, which is being performed by a TMP 401A for a first duration of time, after having controlled the LC-SC gate valve 510 to close, measures an internal pressure of the LC 102 by using a pressure gauge 103 in a condition in which the vacuum evacuation is stopped, and controls the LC-SC gate valve 510 to open if the measured internal pressure has reached a first reference value.
1-15. (canceled)
A vacuum treatment apparatus comprising:
A vacuum treatment method for a vacuum treatment apparatus including:
A vacuum treatment apparatus comprising:
Dependencies are inferred from the claim text.