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US 2023/0401690 A1Published application
Method and system for optimizing optical inspection of patterned structures
AssigneeNova Ltd.
InventorBoaz BRILL
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AssigneeNova Ltd.
InventorBoaz BRILL
Estimating the term…
A system for use in metrology of a patterned structure, the system including a data input utility configured to receive a first type of data related to the patterned structure, the first type of data was obtained by a first type of metrology system and comprises first type measurements and first geometrical information regarding the patterned structure. The data input utility is also configured to receive a second type of data related to the patterned structure, the second type of data was obtained by a second type of metrology system and comprises second type measurement results and second geometrical information regarding the patterned structure; the second type of metrology system differs from the first type of metrology system; and a data processing and analyzing utility configured to determine values of parameters of interest based on the first type of data and the second type of data.
A system for use in metrology of a patterned structure, the system comprising:
A computer implemented method for use in metrology of a patterned structure, the method comprising:
A non-transitory computer readable medium that stores instructions for:
Dependencies are inferred from the claim text.