Integrated circuit device and manufacturing method of the same
AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsChing-Yu HUANG, Wei-Cheng TZENG, Shih-Wei PENG, Wei-Cheng LIN, Jiann-Tyng TZENG
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AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsChing-Yu HUANG, Wei-Cheng TZENG, Shih-Wei PENG, Wei-Cheng LIN, Jiann-Tyng TZENG
Estimating the term…
A method is provided, including following operations: identifying a first contact via, a second contact via, or a combination thereof in a first standard cell, wherein the first contact via is coupled between a first active region and a first conductive line on a first side, and the second contact via is coupled between a second active region and a second conductive line on a second side; calculating a first cell height according to a first width of the first and second active regions, and calculating a second cell height according to a second width of the first and second active regions; calculating multiple first available cell heights based on a ratio between the first and second cell heights; generating layout designs of multiple first cells; and manufacturing at least first one element in the integrated circuit based on the layout designs of the first cells.
A method, comprising:
An integrated circuit, comprising:
A system, comprising:
Dependencies are inferred from the claim text.