Multi Pattern Maskless Lithography Method and System
OwnerUri Goldinventor
Life of this patent
Estimating the term…
Abstract
Maskless lithography apparatus including a chassis supporting a substrate onto which it is desired to write, an optical writing head, the optical writing head operating at at least one of a plurality of at least partially different wavelength/intensity ranges, a displacement subsystem for providing desired relative displacement between the substrate and the optical writing head and a writing controller operative to cause the optical writing head to sequentially write a plurality of different patterns at correspondingly different ones of the at least one of a plurality of at least partially different wavelength/intensity ranges.
Claims26
A maskless lithography apparatus comprising:
- a chassis supporting a substrate onto which it is desired to write;
- an optical writing head, said optical writing head being selectably operable at multiple ones of at least one of a plurality of at least partially different wavelength ranges and a plurality of at least partially different intensity ranges;
- a displacement subsystem for providing desired relative displacement between said substrate and said optical writing head;
- and
- a writing controller operative to cause said optical writing head to sequentially write a plurality of different patterns at correspondingly different ones of said multiple ones of at least one of said plurality of at least partially different wavelength ranges and said plurality of at least partially different intensity ranges.
-3. (canceled)
A maskless lithography apparatus comprising:
- a chassis supporting a substrate onto which it is desired to write;
- an optical writing head, said optical writing head being selectably operable at multiple ones of at least one of a plurality of at least partially different wavelength ranges and a plurality of at least partially different intensity ranges;
- a displacement subsystem for providing desired relative displacement between said substrate and said optical writing head;
- and
- a writing controller operative to cause said optical writing head to write a plurality of different patterns at corresponding ones of said plurality of at least partially different wavelength ranges by writing partially mutually overlapping non-concentric spots at correspondingly different ones of said multiple ones of at least one of said plurality of at least partially different wavelength ranges and said plurality of at least partially different intensity ranges.
-20. (canceled)
A maskless lithography apparatus comprising:
- a chassis supporting a substrate onto which it is desired to write;
- an optical writing head, said optical writing head being selectably operable at multiple ones of a plurality of at least partially different wavelength ranges;
- a displacement subsystem for providing desired relative displacement between said substrate and said optical writing head;
- and
- a writing controller operative to cause said optical writing head to sequentially write a plurality of different patterns at corresponding ones of said plurality of at least partially different wavelength ranges, said plurality of different patterns including patterns for electrical circuit features and alphanumeric characters.
-31. (canceled)
-36. (canceled)
(canceled)
-44. (canceled)
-99. (canceled)
Dependencies are inferred from the claim text.