Method of using wafer stage

A method of controlling a wafer stage, the method comprising:

• moving the wafer stage to position an immersion hood over a first sensor in the wafer stage;
• moving the wafer stage to position the immersion hood over a first particle capture area on the wafer stage after moving the wafer stage to position the immersion hood over the first sensor;
• moving the wafer stage to define a first routing track over the first particle capture area;
• moving the wafer stage to position the immersion hood over a second particle capture area after moving the wafer stage to define the first routing track;
• moving the wafer stage to define a second routing track over the second particle capture area;
• and
• moving the wafer stage to position the immersion hood over an area for receiving a wafer on the wafer stage after defining the second routing track.

A method of controlling a wafer stage, the method comprising:

• placing a wafer on a wafer stage;
• calibrating a position of an immersion hood relative to the wafer stage;
• moving the wafer stage to position an immersion hood over a first particle capture area on the wafer stage after calibrating the position of the immersion hood;
• moving the wafer stage to define a first routing track over the first particle capture area;
• and
• moving the wafer stage to position the immersion hood over an area of the wafer.