Exposure apparatus and wiring pattern forming method

An exposure apparatus comprising:

• a spatial light modulator;
• a generation unit configured to acquire a measurement result from a measurement system that measures positions of semiconductor chips included in each of sets of the semiconductor chips arranged on a first substrate, determine a wiring pattern that connects the semiconductor chips included in each of the sets based on the measurement result, generate first control data used for control of the spatial light modulator in generating the determined wiring pattern, and store the first control data in a first storage unit;
• and
• an exposure processing unit configured to control the spatial light modulator using the first control data stored in the first storage unit and expose the wiring pattern that connects the semiconductor chips included in each of the sets,
• wherein at least one of measurement of the positions of the semiconductor chips on the first substrate, acquisition of the measurement result, determination of the wiring pattern, generation of the first control data, or storage of the first control data in the first storage unit is executed while the exposure processing unit is performing exposure processing on a second substrate different from the first substrate.