Film forming method and atmospheric plasma film forming apparatus

An atmospheric plasma film forming apparatus comprising:

• a pair of electrodes;
• a substrate holding unit that holds a substrate;
• an inner side flow passage that passes between the pair of electrodes and that allows gas to be introduced between the pair of electrodes and the substrate holding unit;
• a first outer side flow passage and a second outer side flow passage that pass through an outer side between the pair of electrodes and that allow gas to be introduced between the pair of electrodes and the substrate holding unit;
• and
• a flow rate control unit that makes, in a case where a gas flow rate between an outlet port of the first outer side flow passage and the substrate holding unit is defined as a first gas flow rate, and a gas flow rate between an outlet port of the second outer side flow passage and the substrate holding unit is defined as a second gas flow rate, the first gas flow rate and the second gas flow rate unequal.