Semiconductor Processing System, and Control Assembly and Method Thereof
AssigneeEnchip Enterprise LLC
InventorJulian Juuchuan Hsieh
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Abstract
This disclosure relates to a semiconductor processing system, and control assembly and method thereof. The semiconductor processing system includes a mass flow controller (MFC), a control assembly and a process chamber. The MFC is coupled to a gas source to receive an input gas. The control assembly, which is coupled to the MFC, includes a charge chamber, an inlet valve and an outlet valve. The charge chamber is arranged to accommodate the input gas. The inlet valve is arranged to control a charge of the input gas for the charge chamber. The outlet valve is arranged to control a release of the input gas accommodated in the charge chamber. The process chamber is coupled to the outlet valve of the control assembly.
Claims13
A method of controlling a semiconductor processing system including a control assembly coupled between a mass flow controller (MFC) and a process chamber, the method comprising:
- operating in a process stage, comprising:
- providing an input gas from a gas source to a precursor tank via the MFC, the precursor tank coupled between the MFC and the control assembly and providing a precursor vapor in the inlet gas to allow the input gas carrying the precursor vapor;
- activating an inlet valve of the control assembly coupled between the gas source and a charge chamber of the control assembly to charge the charge chamber with the input gas carrying the precursor vapor;
- and
- activating a first outlet valve of the control assembly coupled between the charge chamber and the process chamber to release the input gas in the charge chamber into the process chamber.
Dependencies are inferred from the claim text.