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US 2023/0398580 A1Published application
Substrate cleaning apparatus
AssigneeKctech Co., Ltd.
InventorJi Hoon SON
Life of this patent
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Abstract
Provided is a substrate cleaning apparatus, comprising: a substrate support unit for rotating and holding a substrate; a brush unit for cleaning the substrate with a cleaning brush formed in the form of a roll and rotating in contact with a surface of the substrate; and a vibration sensor installed on the brush unit to detect vibrations generated by the contact of the cleaning brush with the substrate, thereby improving process efficiency by predicting cleaning results before cleaning is completed.
Claims20
A substrate cleaning apparatus comprising:
- a substrate support unit that rotates and holds the substrate;
- a brush unit for cleaning the substrate with cleaning brushes formed in a roll and rotating in contact with the surface of the substrate;
- a vibration sensor installed on the brush unit to detect vibrations generated by contact of the cleaning brush with the substrate;
A substrate cleaning apparatus, comprising:
- a substrate support unit that rotates and supports the substrate;
- a brush unit for cleaning the substrate with cleaning brushes formed in a roll and rotating in contact with the surface of the substrate;
- a vibration sensor installed on the brush unit to detect vibrations in the vertical direction generated by the contact of the cleaning brush with the substrate;
- a correction means for correcting the posture of the substrate when an magnitude of the vibration amplitude measured by the vibration sensor falls below a predetermined value.
1 more element
Dependencies are inferred from the claim text.