Imprint device, imprint method, article manufacturing method, and storage medium
AssigneeCanon Kabushiki Kaisha
InventorHIROYUKI MATSUDA
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AssigneeCanon Kabushiki Kaisha
InventorHIROYUKI MATSUDA
Estimating the term…
The present invention is to provide an imprint device that can form a circuit pattern with high accuracy even if a deviation occurs in a positional relationship between the circuit pattern and an alignment mark. The imprint device performs an imprinting process in which a mold on which a pattern is formed is brought in contact with an imprint material on a substrate and the pattern is transferred to the substrate at a target position on the substrate, and includes an alignment unit that performs alignment of the mold with the substrate such that the mold and the substrate are at an alignment position corrected based on an amount of relative positional deviation between a pattern mark formed near the pattern of the mold and an alignment mark of the mold obtained by measuring the pattern mark and the alignment mark, and a curing unit that cures the imprint material at the position at which alignment is performed by the alignment unit.
An imprint device that performs an imprinting process in which a mold on which a pattern is formed is brought in contact with an imprint material on a substrate and the pattern is transferred to the substrate at a target position on the substrate, the imprint device comprising:
An imprint method for performing an imprinting process in which a mold on which a pattern is formed is brought in contact with an imprint material on a substrate and the pattern is transferred to the substrate at a target position on the substrate, the imprint method comprising:
An article manufacturing method comprising:
A non-transitory computer-readable storage medium storing a computer program including instructions for executing following processes of:
Dependencies are inferred from the claim text.