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US 2023/0386801 A1Published application
Plasma processing apparatus
AssigneesTokyo Electron Limited, Kyoto Institute of Technology
InventorsTsuyoshi Moriya, Haruhiko Himura
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Abstract
A plasma processing apparatus includes a processing vessel in which a substrate as a target of a plasma processing is disposed; a plasma forming device configured to form plasma within the processing vessel; a focusing device disposed within the processing vessel, and configured to focus multiple ions in the plasma to output an ion beam; and a sorting device configured to sort out, from the ion beam outputted from the focusing device, a specific ion to be supplied to the substrate.
Claims4
A plasma processing apparatus, comprising:
- a processing vessel in which a substrate as a target of a plasma processing is disposed;
- a plasma forming device configured to form plasma within the processing vessel;
- a focusing device disposed within the processing vessel, and configured to focus multiple ions in the plasma to output an ion beam;
- and
- a sorting device configured to sort out, from the ion beam outputted from the focusing device, a specific ion to be supplied to the substrate.
2 more elements
Dependencies are inferred from the claim text.