Radiation-sensitive resin composition, method of forming pattern, polymer, and compound
AssigneeJsr Corporation
InventorsTakuya OMIYA, Katsuaki NISHIKORI, Kazuya KIRIYAMA, Yuushi MATSUMURA, Natsuko KINOSHITA
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AssigneeJsr Corporation
InventorsTakuya OMIYA, Katsuaki NISHIKORI, Kazuya KIRIYAMA, Yuushi MATSUMURA, Natsuko KINOSHITA
Estimating the term…
A radiation-sensitive resin composition includes: a resin including a structural unit represented by formula (1); a radiation-sensitive acid generator; and a solvent. R1 is a hydrogen atom, a fluorine atom, a methyl group, or a trifluoromethyl group; L1 represents a single bond or —COO-L-; L represents a substituted or unsubstituted alkanediyl group; R2 represents a monovalent hydrocarbon group having 1 to 20 carbon atoms; L2 represents a single bond or a divalent linking group; and Ar represents a group obtained by removing (n+1) hydrogen atoms from an aromatic ring. R3 is independently a halogen atom, a halogenated hydrocarbon group, a hydroxy group, a monovalent hydrocarbon group having 1 to 10 carbon atoms, or a monovalent alkyl ether group having 1 to 10 carbon atoms, and at least one R3 is a halogen atom or a halogenated hydrocarbon group.
A radiation-sensitive resin composition comprising:
A polymer comprising a structural unit represented by formula (2) or formula (3):
A compound represented by formula (5) or formula (6):
Dependencies are inferred from the claim text.