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US 2023/0382933 A1Published application
Molybdenum(0) precursors for deposition of molybdenum films
AssigneeApplied Materials, Inc.
InventorsChandan Kr Barik, John Sudijono, Chandan Das, Doreen Wei Ying Yong, Mark Saly, Bhaskar Jyoti Bhuyan, Feng Q. Liu
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Abstract
Molybdenum(0) and coordination complexes are described. Methods for depositing molybdenum-containing films on a substrate are described. The substrate is exposed to a molybdenum precursor and a reactant to form the molybdenum-containing film (e.g., elemental molybdenum, molybdenum oxide, molybdenum carbide, molybdenum silicide, molybdenum disulfide, molybdenum nitride). The exposures can be sequential or simultaneous.
Claims20
A method of depositing a film, the method comprising:
- exposing a substrate to a molybdenum(0) precursor;
- and
- exposing the substrate to a reactant to form a molybdenum-containing film on a substrate surface, the molybdenum-containing film substantially free of halogen.
A method of depositing a film, the method comprising:
- forming a molybdenum-containing film in a process cycle comprising sequential exposure of a substrate to a molybdenum(0) precursor, purge gas, reactant, and purge gas.
Dependencies are inferred from the claim text.