Laser system, spectrum waveform calculation method, and electronic device manufacturing method
AssigneeGigaphoton Inc.
InventorsNatsuhiko KOUNO, Shunya OIWA, Masato MORIYA
Life of this patent
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Abstract
A laser system connectable to an exposure apparatus includes a spectrometer configured to acquire a measurement waveform from an interference pattern of laser light output from the laser system, and a processor configured to calculate a convolution spectrum waveform using the measurement waveform and a first intermediate function obtained through a process of deconvolution of an aerial image function of the exposure apparatus with an instrument function of the spectrometer.
Claims20
A laser system connectable to an exposure apparatus, comprising:
- a spectrometer configured to acquire a measurement waveform from an interference pattern of laser light output from the laser system;
- and
- a processor configured to calculate a convolution spectrum waveform using the measurement waveform and a first intermediate function obtained through a process of deconvolution of an aerial image function of the exposure apparatus with an instrument function of the spectrometer.
A spectrum waveform calculation method, comprising:
- causing laser light output from a laser system connectable to an exposure apparatus to be incident on a spectrometer;
- acquiring a measurement waveform from an interference pattern of the laser light by the spectrometer;
- and
- calculating a convolution spectrum waveform using the measurement waveform and a first intermediate function obtained through a process of deconvolution of an aerial image function of the exposure apparatus with an instrument function of the spectrometer.
An electronic device manufacturing method, comprising:
- generating laser light using a laser system;
- outputting the laser light to an exposure apparatus;
- and
- exposing a photosensitive substrate to the laser light in the exposure apparatus to manufacture an electronic device,
- the laser system including:
- a spectrometer configured to acquire a measurement waveform from an interference pattern of the laser light output from the laser system connectable to the exposure apparatus;
- and
- a processor configured to calculate a convolution spectrum waveform using the measurement waveform and a first intermediate function obtained through a process of deconvolution of an aerial image function of the exposure apparatus with an instrument function of the spectrometer.
Dependencies are inferred from the claim text.