Wafer cleaning water supply device
AssigneeKurita Water Industries Ltd.
InventorNobuko GAN
Life of this patent
Estimating the term…
Abstract
Wafer cleaning water supply device (1) has a wafer cleaning water production unit (2) that prepares wafer cleaning water (W1) from ultrapure water (W) supplied from a supply path (5), a reservoir (3) for the prepared wafer cleaning water, and a wafer cleaning water supply pipe (6) that supplies the wafer cleaning water (W1) stored in the reservoir (3) to a cleaning nozzle (4A) of a cleaning machine (4). A return pipe (7) is connected to the wafer cleaning water supply pipe (6) on the cleaning machine (4) side so as to be branched at a distance (t) from the tip of the cleaning nozzle (4A), and the wafer cleaning water (W1) which is excessive in the cleaning machine (4) can be returned to the reservoir (3). Such a wafer cleaning water supply device can reduce excessive wafer cleaning water.
Claims8
A wafer cleaning water supply device comprising:
- a wafer cleaning water production unit that dissolves a predetermined amount of a chemical agent in a flow volume of ultrapure water thereby to produce wafer cleaning water having a predetermined concentration of the chemical agent;
- a reservoir that stores the produced wafer cleaning water;
- a wafer cleaning water supply pipe that connects a reservoir and a water cleaning water ejection portion provided in a cleaning machine to supply the wafer cleaning water to the cleaning machine;
- and
- a return pipe that branches from the wafer cleaning water supply pipe and returns part of the wafer cleaning water which is excessive in the cleaning machine to the reservoir,
- wherein the return pipe branches at a point of 10 m or less from the wafer cleaning water ejection portion of the cleaning machine.
Dependencies are inferred from the claim text.