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US 2023/0329987 A1Published application
Sulfate-Free Surfactant System
AssigneeEthox Chemicals, LLC
InventorsEdward T. Borish, Charles F. Palmer, Jr., Marnie Roussel, William Burton Davis, III, Stephanie Anderson, Nora E. H. Bridenstine
Life of this patent
Estimating the term…
Abstract
A colloidal dispersion is provide which is particularly suitable for use in a cleaning system or a personal care product. The colloidal dispersion has a Brookfield Yield Value of at least 50 dyn/cm2 and the cleaning system comprises a structurant and a sulfate-free surfactant.
Claims42
A cleaning system comprising:
- a colloidal dispersion having a Brookfield Yield Value of at least 50 dyn/cm2 comprising:
- a structurant;
- and
- a sulfate-free surfactant.
1 more element
A cleaning system comprising:
- an colloidal dispersion comprising:
- a structurant;
- and
- a sulfate-free surfactant;
- and
- a cleaning agent.
3 more elements
39-73. (canceled)
A cleaning system comprising:
- an colloidal dispersion comprising:
- a structurant with an HLB of at least 4 to no more than 8;
- and
- a sulfate-free surfactant;
- and
- a cleaning agent;
- wherein said colloidal dispersion has an HLB of at least 8.7 to no more than 10.4 and yield of at least 50 dynes/cm2.
4 more elements
A personal care product comprising:
- a colloidal dispersion having a Brookfield Yield Value of at least 50 dyn/cm2 comprising:
- a structurant;
- and
- a sulfate-free surfactant.
1 more element
76-115. (canceled)
Dependencies are inferred from the claim text.