Plasma Chemical Vapor Deposition Process
AssigneeDraka Comteq B.V.
InventorsIgor MILICEVIC, Mattheus Jacobus Nicolaas VAN STRALEN, Gertjan KRABSHUIS, Antonius Henricus Elisabeth BREULS
Life of this patent
Estimating the term…
Loading patent…
AssigneeDraka Comteq B.V.
InventorsIgor MILICEVIC, Mattheus Jacobus Nicolaas VAN STRALEN, Gertjan KRABSHUIS, Antonius Henricus Elisabeth BREULS
Estimating the term…
The present invention relates to a method for manufacturing a primary preform for optical fibers by means of an internal plasma chemical vapor deposition (PCVD) process in a hollow silica substrate tube, the hollow substrate tube having a supply side and a discharge side. An exemplary method comprises depositing doped or non-doped silica layers on the inner surface of the hollow substrate tube by supplying glass-forming gasses to the interior of the hollow substrate tube via the supply side thereof, and by creating a plasma reaction zone in the interior of the hollow substrate tube by means of microwave radiation having a microwave power, wherein the microwave power is decreased during the depositing. The present invention further relates to a method for forming an optical fiber and to the primary preform and optical fiber directly obtainable by such methods.
A method for manufacturing a primary preform for optical fibers by means of an internal plasma chemical vapor deposition (PCVD) process in a hollow silica substrate tube, the hollow substrate tube having a supply side and a discharge side, which method comprises depositing doped or non-doped silica layers on the inner surface of the hollow substrate tube by supplying glass-forming gasses to the interior of the hollow substrate tube via the supply side thereof, and by creating a plasma reaction zone in the interior of the hollow substrate tube by means of microwave radiation having a microwave power, wherein the microwave power is decreased during the depositing.
Dependencies are inferred from the claim text.