Tungsten oxide nanostructure thin films for electrochromic devices
AssigneeHalio, Inc.
InventorsJOHN H. ROUDEBUSH, LINA ZHU, DANIEL GIAQUINTA, HUGUES DUNCAN, HOWARD TURNER
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Abstract
A method of manufacturing a thin film is provided. The method includes providing a plurality of crystalline hexagonal tungsten trioxide particles, size-reducing the crystalline hexagonal tungsten trioxide particles by grinding to produce crystalline hexagonal tungsten trioxide nanostructures, and coating the crystalline hexagonal tungsten trioxide nanostructures onto a substrate to produce a thin film. An electrochromic multi-layer stack is also provided.
Claims20
An electrochromic multi-layer stack comprising:
- a substrate comprising a material with a melting point, a glass transition temperature, or a softening point less than 400° C.;
- an electrically conductive layer on the substrate;
- and
- an electrochromic cathode layer on the electrically conductive layer, wherein the electrochromic cathode layer comprises crystalline tungsten trioxide nanostructures.
A method of manufacturing an electrochromic multi-layer stack comprising:
- forming an electrically conductive layer on the substrate, wherein the substrate comprises a material with a melting point, a glass transition temperature, or a softening point less than 400° C.;
- and
- coating crystalline tungsten trioxide nanostructures onto the electrically conductive layer to produce a thin film.
Dependencies are inferred from the claim text.