Back to results
US 2023/0305208 A1Published application
Thin film optics
AssigneeLockheed Martin Corporation
InventorJoseph Robert BUCK
Life of this patent
Estimating the term…
Abstract
A method of manufacturing a thin film optical apparatus includes providing a substrate and applying an alignment layer over the substrate. The alignment layer ranges from about 50 to 100 nm in thickness. The method includes imprinting a hologram with a desired optic pattern onto the alignment layer and applying at least one layer of mesogen material over the alignment layer.
Claims20
A method of manufacturing an optical apparatus, the method comprising:
- providing a substrate;
- applying at least one alignment layer above the substrate;
- writing a polarization phase hologram into the at least one alignment layer to impart a phase transform comprising an optical pattern;
- and
- applying at least one layer of birefringent material over the alignment layer.
2 more elements
An optical apparatus, comprising:
- a substrate;
- a first alignment layer positioned over the substrate;
- a hologram integrated into the first alignment layer, the hologram comprising an optical pattern;
- and
- a first birefringent layer positioned over the first alignment layer.
2 more elements
An optical apparatus, comprising:
- a substrate;
- a first alignment layer positioned over the substrate;
- and
- a quarter wave retarder positioned between the substrate and the first alignment layer, wherein in response to a light beam incident on the quarter wave retarder, the quarter wave retarder is configured to alter a polarization state.
1 more element
Dependencies are inferred from the claim text.