# US 2023/0264997 A1 · Ultrapure water manufacturing facility > Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt - Number: US 2023/0264997 A1 - Document ID: US20230264997A1 - Status: Published application - Kind: A1 - Application number: 18/111,160 - Filed: 2023-02-17 - Published: 2023-08-24 - Earliest claimed: 2022-02-21 - Assignees: Samsung Electronics Co., Ltd. - Applicants: Samsung Electronics Co., Ltd. - Inventors: Younhaeng Lee; Cheolmin Shin; Seungyong Yang; Wuyoung Choi; Changyeol Ham - Web page: https://patentgrep.com/patent/US20230264997A1 ## CPC - C02F 9/00: Multistage treatment of water, waste water or sewage - B01D 19/0031: {by filtration} - B01D 61/026: {comprising multiple reverse osmosis steps} - B01D 61/04: Feed pretreatment - B01D 61/06: Energy recovery - B01D 61/58: Multistep processes - B01D 61/025: {Reverse osmosis; Hyperfiltration} - B01D 61/422: {Electrodialysis} - B01D 2311/04: Specific process operations in the feed stream; Feed pretreatment - B01D 2311/06: Specific process operations in the permeate stream - B01D 2311/12: Addition of chemical agents - B01D 2311/18: pH control - B01D 2311/2623: Ion-Exchange - B01D 2311/2649: Filtration - B01D 2317/02: Elements in series - B01D 2317/025: Permeate series - C02F 1/004: {using large scale industrial sized filters} - C02F 1/20: by degassing, i.e. liberation of dissolved gases (degasification of liquids in general B01D19/00; arrangement of degassing apparatus in boiler feed supply F22D) - C02F 1/32: with ultraviolet light - C02F 1/42: by ion-exchange (ion-exchange in general B01J) - C02F 1/441: {by reverse osmosis} - C02F 1/444: {by ultrafiltration or microfiltration} - C02F 1/4695: {electrodeionisation} - C02F 1/66: by neutralisation; pH adjustment (for degassing C02F1/20; using ion-exchange C02F1/42; for flocculation or precipitation of suspended impurities C02F1/52; for removing dissolved compounds C02F1/58) - C02F 2001/427: {using mixed beds} - C02F 2101/108: {Boron compounds} - C02F 2103/04: for obtaining ultra-pure water - C02F 2103/346: {from semiconductor processing, e.g. waste water from polishing of wafers} - C02F 2301/046: Recirculation with an external loop - C02F 2301/08: Multistage treatments, e.g. repetition of the same process step under different conditions - C02F 2303/04: Disinfection - C02F 2303/10: Energy recovery - C02F 2303/22: Eliminating or preventing deposits, scale removal, scale prevention (C02F1/042, C02F1/4602, C02F5/00 take precedence) - C02F: TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE (separation in general B01D; special arrangements on waterborne vessels of installations for treating water, waste water or sewage, e.g. for producing fresh water, B63J; adding materials to water to prevent corrosion C23F; treating radioactively-contaminated liquids G21F9/04; regeneration of reactants for recirculation into processes, see the relevant places for the processes) - B01D: SEPARATION (separating solids from solids by wet methods B03B, B03D; by pneumatic jigs or tables B03B; by other dry methods B07; magnetic or electrostatic separation of solid materials from solid materials or fluids, separation by high-voltage electric fields B03C; centrifuges, vortex apparatus B04; presses per se for squeezing-out liquid from liquid-containing material B30B9/02; treatment of water C02F, e.g. softening by ion-exchange C02F1/42; {arrangements of air intake cleaners in gas turbine plants F02C7/05} ; arrangements or mounting of filters in air-conditioning, air-humidification or ventilation F24F13/28) ## Abstract An ultrapure water manufacturing facility includes: a first tank; a plurality of reverse osmosis membranes sequentially arranged downstream of the first tank; an electrodeionization device arranged downstream of the plurality of reverse osmosis membranes; an ion exchange resin tower arranged downstream of the electrodeionization device and filled with a boron selective resin; and a chemical supplier arranged between the plurality of reverse osmosis membranes and configured to supply a pH regulator to treatment-target water. ## Claims ### Claim 1 An ultrapure water manufacturing facility comprising: a first tank; a plurality of reverse osmosis membranes sequentially arranged downstream of the first tank; an electrodeionization device arranged downstream of the plurality of reverse osmosis membranes; an ion exchange resin tower arranged downstream of the electrodeionization device and filled with a boron selective resin; and a chemical supplier arranged between the plurality of reverse osmosis membranes and configured to supply a pH regulator to treatment-target water. ### Claim 2 (depends on 1) The ultrapure water manufacturing facility of claim 1, wherein the pH regulator comprises at least one alkaline reagent selected from NaOH, KOH, and LiOH. ### Claim 3 (depends on 1) The ultrapure water manufacturing facility of claim 1, wherein a pH value of the treatment-target water, to which the pH regulator is supplied, ranges from about 7 to about 10. ### Claim 4 (depends on 1) The ultrapure water manufacturing facility of claim 1, wherein the plurality of reverse osmosis membranes comprise a first reverse osmosis membrane and a second reverse osmosis membrane, and wherein each of the first reverse osmosis membrane and the second reverse osmosis membrane comprises a low-pressure reverse osmosis membrane. ### Claim 5 (depends on 1) The ultrapure water manufacturing facility of claim 1, wherein the boron selective resin comprises a first repeating unit represented by Chemical Formula 1: wherein in Chemical Formula 1, p is an integer of 2 to 10, 4≤q+r≤20, and r is an integer of 2 to 10. ### Claim 6 (depends on 5) The ultrapure water manufacturing facility of claim 5, wherein Chemical Formula 1 is represented by Chemical Formula 2: . ### Claim 7 (depends on 1) The ultrapure water manufacturing facility of claim 1, wherein the ion exchange resin tower is further filled with a mixed bed ion exchange resin. ### Claim 8 (depends on 1) The ultrapure water manufacturing facility of claim 1, further comprising a degasifier arranged downstream of the ion exchange resin tower. ### Claim 9 (depends on 8) The ultrapure water manufacturing facility of claim 8, wherein the degasifier comprises a membrane degasifier. ### Claim 10 (depends on 1) The ultrapure water manufacturing facility of claim 1, further comprising: a circulation unit comprising a first sub-reverse osmosis membrane, wherein the circulation unit is configured to treat concentrated water of the plurality of reverse osmosis membranes and circulate the concentrated water to the first tank. ### Claim 11 (depends on 10) The ultrapure water manufacturing facility of claim 10, wherein the first sub-reverse osmosis membrane comprises a low-pressure reverse osmosis membrane. ### Claim 12 An ultrapure water manufacturing facility comprising: a first tank; a heat exchanger arranged downstream of the first tank; a first filter and a second filter, which are sequentially arranged in the stated order downstream of the heat exchanger; a first reverse osmosis membrane arranged downstream of the second filter; a circulation unit comprising a first sub-tank and a first sub-reverse osmosis membrane, the circulation unit being configured to treat concentrated water of the first reverse osmosis membrane and circulate the concentrated water to the first tank; a second tank arranged downstream of the first reverse osmosis membrane; a first ultraviolet sterilizer arranged downstream of the second tank; a third filter arranged downstream of the first ultraviolet sterilizer; a second reverse osmosis membrane arranged downstream of the third filter; an electrodeionization device arranged downstream of the second reverse osmosis membrane; a third tank arranged downstream of the electrodeionization device; a second ultraviolet sterilizer arranged downstream of the third tank; an ion exchange resin tower arranged downstream of the second ultraviolet sterilizer and filled with a boron selective resin; a membrane degasifier arranged downstream of the ion exchange resin tower; and a chemical supplier configured to supply a pH regulator to treatment-target water flowing from the second tank to the first ultraviolet sterilizer. ### Claim 13 (depends on 12) The ultrapure water manufacturing facility of claim 12, wherein each of the first reverse osmosis membrane, the first sub-reverse osmosis membrane, and the second reverse osmosis membrane comprises a low-pressure reverse osmosis membrane. ### Claim 14 (depends on 12) The ultrapure water manufacturing facility of claim 12, wherein the pH regulator comprises NaOH, and wherein a pH value of the treatment-target water, to which the pH regulator is supplied, ranges from about 7 to about 10. ### Claim 15 (depends on 12) The ultrapure water manufacturing facility of claim 12, wherein the ion exchange resin tower is further filled with a mixed bed ion exchange resin. ### Claim 16 (depends on 12) The ultrapure water manufacturing facility of claim 12, wherein the first ultraviolet sterilizer irradiates ultraviolet light having a wavelength of 254 nm, and wherein the second ultraviolet sterilizer irradiates ultraviolet light having a wavelength of 185 nm. ### Claim 17 An ultrapure water manufacturing facility comprising: a pre-treatment facility, which comprises a first tank, a first reverse osmosis membrane arranged downstream of the first tank, and a circulation unit comprising a first sub-reverse osmosis membrane, the circulation unit being configured to treat concentrated water of the first reverse osmosis membrane and circulate the concentrated water to the first tank; a first make-up facility, which comprises a second tank, a second reverse osmosis membrane arranged downstream of the second tank, an electrodeionization device arranged downstream of the second reverse osmosis membrane, and a chemical supplier configured to supply a pH regulator to treatment-target water flowing from the second tank to the second reverse osmosis membrane; a second make-up facility, which comprises a third tank, an ion exchange resin tower arranged downstream of the third tank and filled with a boron selective resin, and a first degasifier arranged downstream of the ion exchange resin tower; and a polishing facility, which comprises a fourth tank, a first polisher arranged downstream of the fourth tank, a second degasifier arranged downstream of the first polisher, a second polisher arranged downstream of the second degasifier, and an ultrafiltration membrane arranged downstream of the second polisher. ### Claim 18 (depends on 17) The ultrapure water manufacturing facility of claim 17, wherein each of the first reverse osmosis membrane, the first sub-reverse osmosis membrane, and the second reverse osmosis membrane comprises a low-pressure reverse osmosis membrane. ### Claim 19 (depends on 17) The ultrapure water manufacturing facility of claim 17, wherein the boron selective resin comprises a first repeating unit represented by Chemical Formula 3: . ### Claim 20 (depends on 17) The ultrapure water manufacturing facility of claim 17, wherein the first polisher comprises an ion exchange resin tower filled with a catalyst ion exchange resin, and wherein the second polisher comprises a mixed bed ion exchange resin tower.